According to [17], the appearance of these two low-temperature phases of Ni silicides after annealing in vacuum would be evidence that the original Ni film has been completely (or nearly completely) consumed by the growing Ni2Si phase).a In this case, the volume fraction of Ni2Si/NiSi 85:15 (taking into account all uncertainties, the maximum estimate yields 100% of Ni2Si); the mass fraction of Ni2Si exceeds 88%. This obviously contradicts our TEM observations and makes us assume the presence of the heaviest of the Ni silicides,

Ni3Si [18], which also may form at low temperatures, especially taking into account the possible presence of oxygen in the metal film that, according to [17, 22], impedes diffusion of Ni atoms to VX-765 molecular weight LY2157299 mouse Ni/Ni2Si interface and, in our opinion, may result in simultaneous formation of Ni2Si and Ni3Si phases in the silicide film. If our assumption is true, the silicide film might be composed,

by a rough estimate, of 20% to 40% of Ni3Si, 30% to 60% of Ni2Si, and 10% to 30% of NiSi in respective proportions to give a total of 100% of the silicide film volume. The lightest (the least dense) silicide phase having a Si-rich stoichiometry (disilicide) may also be available in the form of a thin diffusion layer at the Ni silicide/poly-Si interface (this does not contradict our observations) [23]; it may affect the barrier height of the whole silicide layer, however [20]. I-V characteristics of the structures (Figure 2a,b) with low-resistance

poly-Si ( ), which forms in our process, manifest a diode behavior with the rectification ratios changing from about 100 to about 20 for the temperature varied from 22°C to 70°C (Figure Lenvatinib order 2c). At liquid nitrogen temperature, the rectification becomes more pronounced and exceeds 1,000 at biases exceeding 2 V (Figure 3). It should be noticed that at forward bias, the negative lead was set on the silicide top contact pad, whereas the positive one was set on the contact pad to the polysilicon film. Figure 2 I – V characteristics of the Ni silicide/poly-Si structure and its rectification ratios at different temperatures. (a) Forward and (b) reverse biases; (c) rectification ratio vs. the applied voltage. Figure 3 I – V characteristics of the Ni silicide/poly-Si structure and its rectification ratios at liquid nitrogen and room temperatures. (a) I-V characteristics and (b) rectification ratio as a function of the applied bias. Photo-electromotive force (emf) spectra obtained at 300 and 80 K (Figure 4) demonstrate photoresponse for photons with energies greater and less than the Si bandgap width (E g) as well as the presence of a number of potential barriers in the diode film. Room temperature measurements with and without a silicon filter have revealed the only barrier with the height Φ rt≈0.